
CVD polycrystalline
Deposited layer by layer from a carbon-bearing gas in a plasma reactor, then separated from the growth substrate to produce free-standing wafers up to Ø 100 mm.
The choice when a part needs area: large heat spreaders, optical windows and wear surfaces that can be laser-cut to almost any outline.
- Thermal conductivity
- 1,000–2,000 W/m·K
- Wafer size
- Up to Ø 100 mm
- Thickness
- 0.1–2.0 mm
Best for
- 01Heat spreaders above a few millimetres
- 02Optical and microwave windows
- 03Large wear surfaces

